| 摘要 |
<p>A method of photofabrication in which a model pattern of photofabrication product can be taken out with high precision, and in which even in the fabrication of a pattern of minute structure or microstructure, fabrication with high precision can be performed.There is provided a method of photofabrication comprising irradiating a photohardening composition layer with light to thereby convert the photohardening composition to a hardened resin layer, forming once more a photohardening composition layer on the hardened resin layer, irradiating the same with light to thereby convert the photohardening composition to a further hardened resin layer and repeating these operations to thereby obtain a matter of three-dimensional configuration composed of an integrated laminate of hardened resin layers, wherein the photohardening composition layer is produced by coating a base material, or hardened resin layer formed on the base material, with a photohardening resin composition containing a resin, an ethylenically unsaturated compound and an organic solvent and removing the organic solvent contained in the photohardening resin composition, and wherein after completion of the formation of all the hardened resin layers, any unhardened photohardening composition within the hardened resin layers is removed to thereby accomplish formation of a matter of three-dimensional configuration.</p> |
