发明名称 |
PLANAR HEATER AND SEMICONDUCTOR HEAT TREATMENT APPARATUS PROVIDED WITH THE HEATER |
摘要 |
<p>Provided is a planar heater which suppresses high frequency induction heat by incorporating an earth electrode for suppressing high frequency induction and does not corrode with an excited reaction gas. A semiconductor heat treatment apparatus provided with such planar heater is also provided. A planar heater (1) is provided with a carbon wire heating body (CW) arranged and sealed in planar state inside a silica-glass-board-shaped body (2), and an earth electrode (3) arranged and sealed in a planar state in the silica-glass-board-shaped body (2) above the carbon wire heating body (CW).</p> |
申请公布号 |
WO2008038477(A1) |
申请公布日期 |
2008.04.03 |
申请号 |
WO2007JP66230 |
申请日期 |
2007.08.22 |
申请人 |
COVALENT MATERIALS CORPORATION;TOKYO ELECTRON LIMITED;SHIBATA, KAZUO;KAWASAKI, HIROO |
发明人 |
SHIBATA, KAZUO;KAWASAKI, HIROO |
分类号 |
H05B3/14;H01L21/205;C23C16/46;H01L21/02;H05B3/28;H05B3/74;H05B3/86 |
主分类号 |
H05B3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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