发明名称 PLANAR HEATER AND SEMICONDUCTOR HEAT TREATMENT APPARATUS PROVIDED WITH THE HEATER
摘要 <p>Provided is a planar heater which suppresses high frequency induction heat by incorporating an earth electrode for suppressing high frequency induction and does not corrode with an excited reaction gas. A semiconductor heat treatment apparatus provided with such planar heater is also provided. A planar heater (1) is provided with a carbon wire heating body (CW) arranged and sealed in planar state inside a silica-glass-board-shaped body (2), and an earth electrode (3) arranged and sealed in a planar state in the silica-glass-board-shaped body (2) above the carbon wire heating body (CW).</p>
申请公布号 WO2008038477(A1) 申请公布日期 2008.04.03
申请号 WO2007JP66230 申请日期 2007.08.22
申请人 COVALENT MATERIALS CORPORATION;TOKYO ELECTRON LIMITED;SHIBATA, KAZUO;KAWASAKI, HIROO 发明人 SHIBATA, KAZUO;KAWASAKI, HIROO
分类号 H05B3/14;H01L21/205;C23C16/46;H01L21/02;H05B3/28;H05B3/74;H05B3/86 主分类号 H05B3/14
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