| 摘要 |
An exposure system is provided to inhibit non-uniformity in the size and energy intensity of spot regions, thereby preventing non-uniform resolution or gradation in the image formed by an imaging device. An exposure system comprises: a first array(G1) of light sources having a plurality of light sources aligned in a first direction; a second array(G2) of light sources having a plurality of light sources aligned in the first direction at a position spaced apart from each light source of the first array along a second direction across the first direction; and a collector for collecting the light ejected from each light source of the first array and the second array toward a surface to be exposed, wherein the surface is multiply exposed by the light from the light sources of the first array and the light sources of the second array disposed in the second direction to the corresponding light sources. In the exposure system, the distance(S1) taken along the first direction between the center of the first light source(E1) of the first array and the second light source(E2) of the second array disposed in the second direction to the first light source is greater than the distance(S2) taken along the first direction between the center of the third light source(E3) spaced farther apart from the axis of the collector than the first light source(E4) of the first array and the fourth light source of the second array disposed in the second direction to the third light source. |
