CLEANING PROBE AND WAFER CLEANING EQUIPMENT WITH CLEANING PROBE

摘要

A cleaning probe and a wafer cleaning apparatus having the same are provided to prevent damage of a wafer by reducing pattern damage through a cleaning probe having double materials. A probe vibrator(240) generates a megasonic wave. A coupling unit(210) is connected to the probe vibrator. A first wave transmission unit(220) is extended from the coupling unit to transmit the megasonic wave. A second wave transmission unit(230) is positioned in the inside of the first wave transmission unit. The second wave transmission unit transmits a megasonic wave. The megasonic wave of the second wave transmission unit is different from the megasonic wave generated from the first wave transmission unit.