| 摘要 |
PROBLEM TO BE SOLVED: To provide a lid positioning structure which does not cause damage to lids. SOLUTION: The apparatus is provided with a processing chamber for processing a substrate held in a substrate holding tool; a reaction container forming the processing chamber and having an opening at its bottom; a heating means arranged at the external periphery of the reaction container and heating the inside of the processing chamber; a first lid for closing the opening of the reaction container, and having a positioning portion formed on one part of the external peripheral side surface and a first fitting portion formed at the center of the bottom surface; a second lid formed of a material having a thermal expansion ratio larger than that of the first lid, having a second fitting portion rotatably fitted to the first fitting portion of the first lid, and used for supporting the first lid; and a positional deviation preventing member provided at the second lid, and formed of a material having larger elasticity higher than that of the first lid disposed on a position opposite to the positioning portion. COPYRIGHT: (C)2008,JPO&INPIT
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