发明名称 SURFACE ANALYSIS METHOD AND SECONDARY ION MASS SPECTROMETRY
摘要 PROBLEM TO BE SOLVED: To provide a pretreating method which enables the measurement of a high-insulating sample while preventing the sample from being charged, without any contamination. SOLUTION: A surface analysis method for irradiating a high-insulating object sample to be analyzed with energies of ionizing radiation, ion beams and the like and analyzes the surface of the sample by introducing energies of secondary electrons, secondary ions and the like emitted from the sample, comprises: forming a conductive thin film in the form of a mesh on the high-insulating object sample to be analyzed; and irradiating a portion of the sample on which no conductive thin film is formed, with energies of the ionizing radiation, the ion beams and the like. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008076341(A) 申请公布日期 2008.04.03
申请号 JP20060258705 申请日期 2006.09.25
申请人 TOPPAN PRINTING CO LTD 发明人 IDA ISATO
分类号 G01N23/225;G01N1/28 主分类号 G01N23/225
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