<p>This invention relates to a substrate holding apparatus for use in ion implanters. In particular, the present invention relates to a substrate holding system comprising two or more substrate holders that can adopt interchangeable positions, thereby allowing one substrate holder to scan a substrate through an ion beam while substrates can be swapped on the other substrate holder. The substrate holder assembly comprises a base rotatable about a first axis and at least two support arms extending from the base to ends provided with substrate holders. Rotating the base allows the substrate holders to move between designated positions. One designated position may correspond to a position for implanting a substrate and another designated position may correspond to a loading/unloading station.</p>
申请公布号
WO2008037953(A1)
申请公布日期
2008.04.03
申请号
WO2007GB03452
申请日期
2007.09.12
申请人
APPLIED MATERIALS, INC.;RELLEEN, KEITH, DAVID, JOHN;HOLTAM, TRISTAN, RICHARD
发明人
RELLEEN, KEITH, DAVID, JOHN;HOLTAM, TRISTAN, RICHARD