发明名称 Fabrication of a wiring pattern and of an active matrix substrate
摘要 A method for fabricating a wiring pattern (33) on a substrate (P) comprises the steps of: forming a first region (H1) corresponding to a formation region of the pattern, and a second region (H2) surrounding the first region, on the substrate; disposing a first function liquid (X1) on the first region; disposing a second function liquid (X2) on the first function liquid; and applying predetermined treatments to the first and the second function liquids which are disposed on the first region so as to form the pattern with plural materials stacked one on the other, wherein the second region has a liquid-repellency with respect to the first function liquid higher than that of the first region, the first and second function liquids include a conductive material.
申请公布号 EP1906442(A2) 申请公布日期 2008.04.02
申请号 EP20070075847 申请日期 2004.05.10
申请人 SEIKO EPSON CORPORATION 发明人 HIRAI, TOSHIMITSU
分类号 G02F1/1343;H01L21/768;B05D5/12;B05D7/00;G02F1/136;G02F1/1362;G09F9/00;H01L21/288;H01L21/3205;H01L21/336;H01L21/77;H01L27/12;H01L27/32;H01L29/786;H01L51/00;H01L51/40;H01L51/50;H05B33/02;H05B33/10;H05K3/12 主分类号 G02F1/1343
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