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发明名称
Seqeuntial Chemical Vapor Deposition
摘要
申请公布号
KR100818792(B1)
申请公布日期
2008.04.02
申请号
KR20077014845
申请日期
2007.06.28
申请人
发明人
分类号
B01J19/08;C23C16/50;C23C16/44;C23C16/452;C23C16/455;C23C16/507;C30B25/14;H01L21/31
主分类号
B01J19/08
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代理人
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