发明名称 Pressure-contact semiconductor device
摘要 A pressure-contact semiconductor device (100) includes thermal buffer plates (2) and main electrode blocks (3) having flanges (4), by which semiconductor substrate (1) having a pair of electrodes is sandwiched, disposed opposed to each side thereof, wherein the semiconductor substrate (1) is sealed in a gastight space by joining the flanges (4) to insulating container (5). The semiconductor device (100) is configured such that the outermost periphery of the semiconductor substrate (1) is enclosed by hollow cylindrical insulator (9) fitted on outer peripheries of the main electrode blocks (3) in the gastight space with O-rings (8) fitted between the main electrode blocks (3) and the cylindrical insulator (9), and sealed with reaction force from the O-rings (8).
申请公布号 EP1906443(A2) 申请公布日期 2008.04.02
申请号 EP20070004143 申请日期 2007.02.28
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 TAGUCHI, KAZUNORI;OOTA, KENJI
分类号 H01L23/051;H01L23/04 主分类号 H01L23/051
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