| 摘要 |
<p>A film forming system includes a vacuum chamber (210,310) having a gas inlet (214) for a film-forming gas (G) and a gas outlet (15). A target holder (12) is disposed in the vacuum chamber (210,310) to hold a target (T), a substrate holder (11) is opposed to the target holder (12) and holds a film-forming substrate (B) on which film is formed and a plasma forming portion (12,13) generates plasma between the target holder (12) and the film-forming substrate (B) . The film-forming system is characterized by having a shield (250) which surrounds the outer peripheral surface of the target holder (12) facing the substrate (B). The shield comprises a plurality of shield layers (250a).</p> |
