发明名称 Semiconductor device
摘要 There is a problem that a reverse off-leak current becomes too large in a Schottky barrier diode. A semiconductor device of the present invention includes P-type first and second anode diffusion layers 5, 6 formed in an N-type epitaxial layer 3, N-type cathode diffusion layers 4 formed in the epitaxial layer 3, a P-type third anode diffusion layer 7, 8 formed in the epitaxial layer 3 so as to surround the first and second anode diffusion layers 5, 6 and to extend toward the cathode diffusion layers 4, and a Schottky barrier metal layer 14 formed on the first and second anode diffusion layers 5, 6.
申请公布号 EP1906454(A2) 申请公布日期 2008.04.02
申请号 EP20070019157 申请日期 2007.09.28
申请人 SANYO ELECTRIC CO., LTD.;SANYO SEMICONDUCTOR CO., LTD. 发明人 KIKUCHI, SHUICHI;OKAWA, SHIGEAKI;NAKAYA, KIYOFUMI;TANAKA, SHUJI
分类号 H01L29/866;H01L27/07;H01L29/06;H01L29/40;H01L29/47;H01L29/872 主分类号 H01L29/866
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