| 摘要 |
A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1):
wherein Y 1 to Y 13 each independently represents a hydrogen atom or a substituent, and adjacent members of Y 1 to Y 13 may combine with each other to form a ring; and Z represents a single bond or a divalent linking group. |
