发明名称 |
Instrument for measuring the angular distribution of light produced by an illumination system of a microlithographic projection exposure apparatus |
摘要 |
An instrument for measuring the angular distribution of light produced by an illumination system of a microlithographic projection exposure apparatus comprises pinhole (82) and a polarization conversion unit (92), for example a quarter-wave plate, that converts at least one state of polarization of the light into a circular state of polarization. An irradiance sensor (96) such as a CCD image sensor detects the spatial distribution of light having passed the pinhole (82) and being in a circular state of polarization. An aspheric collimating lens (90) may be arranged between the pinhole (82) and the polarization conversion unit (92).
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申请公布号 |
EP1906252(A1) |
申请公布日期 |
2008.04.02 |
申请号 |
EP20060020464 |
申请日期 |
2006.09.28 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
FIOLKA, DAMIAN;KARL, GERHARD;NATT, OLIVER |
分类号 |
G03F7/20;G01J1/08;G01J1/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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