发明名称 Instrument for measuring the angular distribution of light produced by an illumination system of a microlithographic projection exposure apparatus
摘要 An instrument for measuring the angular distribution of light produced by an illumination system of a microlithographic projection exposure apparatus comprises pinhole (82) and a polarization conversion unit (92), for example a quarter-wave plate, that converts at least one state of polarization of the light into a circular state of polarization. An irradiance sensor (96) such as a CCD image sensor detects the spatial distribution of light having passed the pinhole (82) and being in a circular state of polarization. An aspheric collimating lens (90) may be arranged between the pinhole (82) and the polarization conversion unit (92).
申请公布号 EP1906252(A1) 申请公布日期 2008.04.02
申请号 EP20060020464 申请日期 2006.09.28
申请人 CARL ZEISS SMT AG 发明人 FIOLKA, DAMIAN;KARL, GERHARD;NATT, OLIVER
分类号 G03F7/20;G01J1/08;G01J1/42 主分类号 G03F7/20
代理机构 代理人
主权项
地址