Method for fabricating photo mask with using Cr layer as phase shifter,申请号KR20050114441-传众专利搜索

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发明名称	Method for fabricating photo mask with using Cr layer as phase shifter
摘要
申请公布号	KR100818704(B1)	申请公布日期	2008.04.02
申请号	KR20050114441	申请日期	2005.11.28
申请人		发明人
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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