发明名称 Manufacturing method of semiconductor device
摘要 <p>The present invention relates to a manufacturing method of a semiconductor device having a size approximately same as the size of a semiconductor chip when viewed in a plan view, in which the semiconductor chip is flip-chip bonded to a wiring pattern, and an object of the invention is to provide the manufacturing method of a semiconductor device which allows reduction in the number of process steps to realize the minimization of manufacturing cost. An insulating resin 13 is formed so as to cover a plurality of internal connection terminals 12 and a surface of a plurality of semiconductor chips 11 on which the plurality of internal connection terminals are provided, then a metal layer 33 for forming a wiring pattern is formed over the insulating resin 13, and by pressing the metal layer 33, the metal layer 33 and the plurality of internal connection terminals 12 are pressure-bonded.</p>
申请公布号 EP1906445(A2) 申请公布日期 2008.04.02
申请号 EP20070018290 申请日期 2007.09.18
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 YAMANO, TAKAHARU;ARAI, TADASHI
分类号 H01L23/31;H01L23/525 主分类号 H01L23/31
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