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发明名称
Semiconductor manufacturing apparatus and pattern formation method
摘要
申请公布号
EP1610180(A3)
申请公布日期
2008.04.02
申请号
EP20050012156
申请日期
2005.06.06
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD
发明人
ENDO, MASAYUKI;SASAGO, MASARU
分类号
G03F7/11;G03F7/20;G03F7/00;H01L21/027;H01L21/30
主分类号
G03F7/11
代理机构
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