发明名称 APPARATUS OF HANDLING MASK
摘要 <p>A mask handling apparatus is provided to improve efficiency in a mask manufacturing process by preventing generation of particles. A plurality of holder parts(231) comes in contact with an edge part of a mask substrate(100) to support the mask. A plurality of holder blocks(235) are formed to fix or rotate the mask substrate by fixing or rotating the holder parts. The holder parts are attached to a branch-shaped supporting part(210) to be introduced to both sides of the mask substrate. The holder blocks include a driving motor for rotating the holder parts. The holder blocks include a rotary handle part for rotating the holder parts by a manual operation of an operator.</p>
申请公布号 KR20080028710(A) 申请公布日期 2008.04.01
申请号 KR20060094368 申请日期 2006.09.27
申请人 HYNIX SEMICONDUCTOR INC. 发明人 GYUN, BYUNG GU
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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