发明名称 Structure and method for manufacturing semiconductor device with capacitor and fuse
摘要 A semiconductor device with a capacitor and a fuse, and a method for manufacturing the same are described. The semiconductor device comprises a semiconductor substrate having a capacitor region and a fuse region defined therein, a insulating layer over the semiconductor substrate, a storage node hole formed in the insulating layer, a barrier metal in the storage node hole, a dielectric layer formed on the barrier metal and the insulating layer, a lower metal layer for a plate electrode filling the storage node hole such that it is flush with the dielectric layer, an upper metal layer for the plate electrode on the dielectric layer and lower metal layer for the plate electrode; and a fuse metal layer formed of the same material as that of the upper metal layer for the plate electrode on the dielectric layer in the fuse region.
申请公布号 KR100818707(B1) 申请公布日期 2008.04.01
申请号 KR20060059910 申请日期 2006.06.29
申请人 发明人
分类号 H01L21/82;H01L21/8242 主分类号 H01L21/82
代理机构 代理人
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