ORGANIC CHEMICAL VAPER DEPOSITION APPARATUS AND ORGANIC COMPOUNDS VAPER DEPOSITION METHOD

摘要

An organic chemical vapor deposition apparatus and an organic compound vapor deposition method are provided to increase an organic deposition speed and to form uniformly a thickness of an organic material to be deposited on a substrate. A stage(220) is installed at one side of an inside of a chamber(250). A substrate(S) is loaded on the stage. A source supply unit(100) supplies process chamber into the inside of the chamber. An ionization unit(300) ionizes the process gas to be deposited on the substrate. An exhaust tube(230) is installed at the other side of the inside of the chamber to exhaust the ionized process gas. A power supply unit(400) is installed at the stage to apply electric power having polarity which is different from the polarity of the electric power applied to the ionized process gas.