| 摘要 |
An inductively coupled plasma reactor for processing large area plasma is provided to generate uniform large-area plasma having high density by improving a structure of a wireless frequency antenna and a gas supplying structure. An inductively coupled plasma reactor for processing large area plasma includes a vacuum chamber(10) having a substrate support where a substrate to be processed is positioned. A dielectric window(34) is installed at an upper portion of the vacuum chamber. A wireless frequency antenna(30) is arranged in a region of the dielectric window. A gas shower head is installed at the center of the dielectric window to inject a first process gas applied from a gas source(20) to the vacuum chamber. A first power supply unit applies a power having a first frequency to the wireless frequency antenna. A second power source applies a power having a second frequency to the gas shower head. |
