ALIGNMENT KEY FOR EXPOSURE PROCESS

摘要

An alignment key for an exposure process is provided to increase a pattern density and prevent a key from being damaged in a CMP process by using a merged key of an LSA(laser stop alignment) key and an FIA(field image alignment) key. An alignment key for an exposure process is made of a merged key(30) in which columns of a plurality of divided key patterns(10a) of an LSA key are positioned in parallel between a line key patterns(20a) of an FIA key. The merged key can have one position coordinates so that the position coordinates don't need to be corrected in changing a key. The line key pattern and the column of the divided key pattern can be separated from each other by a predetermined interval.