发明名称 TEMPLATE DERIVATIVE FORMING ULTRA-LOW DIELECTRICS AND METHOD OF FORMING ULTRA-LOW DIELECTRICS USING THE SAME
摘要 A template derivative for forming ultra-low dielectrics is provided to produce ultra-low dielectric films having excellent mechanical strength. A template derivative for forming ultra-low dielectrics is a glucose derivative represented by the following formula 1, wherein R represents (CH2)n-SiH3(wherein, n represents an integer of 1-3). The glucose derivative is formed by subjecting a reactive glucose precursor and allyl bromide to allylation, followed by performing a hydrosilylation reaction using SiH4 gas. A method of forming ultra-low dielectrics using the template derivative includes the steps of: forming film using the glucose derivative; and hardening the film in a hydrogen peroxide atmosphere.
申请公布号 KR100818114(B1) 申请公布日期 2008.03.31
申请号 KR20070042106 申请日期 2007.04.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 MIN, SUNG KYU;KU, JA CHUN;KIM, CHAN BAE;AHN, SANG TAE;CHUNG, CHAE O;AN, HYEON JU;LEE, HYO SEOK;KIM, EUN JEONG
分类号 H01B3/46;C07F7/02;H01L21/28;H01L21/31 主分类号 H01B3/46
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