发明名称 |
TEMPLATE DERIVATIVE FORMING ULTRA-LOW DIELECTRICS AND METHOD OF FORMING ULTRA-LOW DIELECTRICS USING THE SAME |
摘要 |
A template derivative for forming ultra-low dielectrics is provided to produce ultra-low dielectric films having excellent mechanical strength. A template derivative for forming ultra-low dielectrics is a glucose derivative represented by the following formula 1, wherein R represents (CH2)n-SiH3(wherein, n represents an integer of 1-3). The glucose derivative is formed by subjecting a reactive glucose precursor and allyl bromide to allylation, followed by performing a hydrosilylation reaction using SiH4 gas. A method of forming ultra-low dielectrics using the template derivative includes the steps of: forming film using the glucose derivative; and hardening the film in a hydrogen peroxide atmosphere.
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申请公布号 |
KR100818114(B1) |
申请公布日期 |
2008.03.31 |
申请号 |
KR20070042106 |
申请日期 |
2007.04.30 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
MIN, SUNG KYU;KU, JA CHUN;KIM, CHAN BAE;AHN, SANG TAE;CHUNG, CHAE O;AN, HYEON JU;LEE, HYO SEOK;KIM, EUN JEONG |
分类号 |
H01B3/46;C07F7/02;H01L21/28;H01L21/31 |
主分类号 |
H01B3/46 |
代理机构 |
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主权项 |
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