| 摘要 |
A substrate processing apparatus is provided to prevent poor drying by removing a process liquid from a surface of substrate using a liquid of fluorinated solvent and a gas of fluorinated solvent. A substrate processing apparatus includes a processing bath(31) storing a liquid of fluorinated solvent, and a chamber housing the processing bath. A holding mechanism(42) moves between a first position in which substrates(9) are arranged in the processing bath and a second position in which the substrates are arranged above the processing bath, with the substrates being held in the chamber. A gas supply part supplies gas of fluorinated solvent to the substrates held by the holding mechanism, after the substrates processed by the liquid of fluorinated solvent in the first position are moved from the first position to the second position.
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