| 摘要 |
An apparatus and a method for supplying thermal conduction gas, and a substrate processing apparatus and method, and a computer-readable storage medium are provided to enable the thermal conduction gas to flow into a thermal conduction gas tank in an undercurrent state temporarily from a thermal conduction gas supply unit and supply the thermal conduction gas to a space between a loading stand and a processed substrate, thereby shortening time required to process the processed substrate and improving processing quality. A thermal conduction gas supply unit(30) supplies thermal conduction gas to a space. A thermal conduction gas tank(31,32) enables the thermal conduction gas to be in an undercurrent state temporarily. A first thermal conduction gas path(34) has an end portion connected to the thermal conduction gas supply unit and the other end portion connected to the space, and guides the thermal conduction gas to the space. A second thermal conduction gas path(35,36) is diverged from the first thermal conduction gas path to connect with the thermal conduction gas tank, and guides the thermal conduction gas of the first thermal conduction gas path to the thermal conduction gas tank, and guide the thermal conduction gas in the undercurrent state to the first thermal conduction gas path. The thermal conduction gas is stored in the undercurrent state in the thermal conduction gas tank from the thermal conduction gas supply unit. The thermal conduction gas in the undercurrent state is supplied to the space. |
