DIRECTING A FLOW OF GAS IN A SUBSTRATE PROCESSING CHAMBER,申请号KR20010047517-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	DIRECTING A FLOW OF GAS IN A SUBSTRATE PROCESSING CHAMBER
摘要
申请公布号	KR100817464(B1)	申请公布日期	2008.03.31
申请号	KR20010047517	申请日期	2001.08.07
申请人		发明人
分类号	H01L21/205;C23C16/44;C23C16/455;H01J37/32;H01L21/302;H01L21/3065;H01L21/31	主分类号	H01L21/205
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Bispecific antibody heterodimers

Mammalian ribonuclease inhibitors and use thereof

Radio frequency energy delivery system for multipolar electrode catheters

Films having improved characteristics and methods for their preparation and use

Ultrasonic imaging system and method

Compositions and methods for modulating cellular NF- kappa B activation

Vaccine comprising eimeria spp. gametocyte antigen

Circuit breaker with quick closing mechanism

Pharmaceutical composition for piperidinoalkanol compounds

Method and circuit for calculating metrics for an analog viterbi detector

Method for transmitting messages in an elevator group control system

Method for preparation of a hardening composition

Rotatable food serving housing

Heated fluid conduit

Integral imaging lens sheets

Display device having a video bandwidth controller

CONNECTING STRUCTURE FOR PISTON AND CONNECTING ROD

RING-LIKE BELT CONVEYING-LOADING AND UNLOADING METHOD AND DEVICE THEREOF