| 摘要 |
A process apparatus for fabricating a semiconductor device is provided to prevent or minimize a process error and a notch decision error by installing a filtering unit at an orienter. A process apparatus(200) for fabricating a semiconductor device includes a substrate transfer module(210), an orienter(220), and a filtering unit. The substrate transfer module is formed to transfer a semiconductor substrate. The orienter is formed to determine a notch of a wafer. The filtering unit is installed at the orienter. The filtering unit changes a flow rate to apply external air of the orienter to the substrate transfer module. The filtering unit is formed with a fan filter unit(222) which is attached on the orienter. The process apparatus corresponds to an etch apparatus.
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