摘要 |
<p>The device has an opaque pattern (1) corresponding to replica of interior of an implant transfer, where the pattern has the taper between 0 to 35 degrees. A false implant stump (5) is positioned on the pattern, and a space is provided between a base of the pattern and a false stump (5). The space is filled by a paste to be modeled or a preform (2) permitting to give adapted shape to an occlusal surface of the false implant stump.</p> |