| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus that can accurately detect the fluctuation of minute amount of gas flow and the fluctuation of pressure by a relatively low-cost method and without being dependent upon the process conditions, and to provide a method for plasma processing. <P>SOLUTION: The plasma processing apparatus comprises a process chamber 101, a pressure measurement equipment 401 that measures the pressure inside the process chamber 101, and a pump 403 that ejects gas inside the process chamber 101. Between the pump 403 and the process chamber 101, a pressure control valve 402 is provided to maintain the pressure inside the process chamber 101 to a predetermined pressure level by changing the opening based upon the measured value of the pressure measurement equipment 401. The exhaust capacity controller 508 sets exhaust capacity so that an amount of change of the opening of pressure control valve 402 gets large according to the pressure fluctuation inside the process chamber 101. An operation part 500 detects a minute fluctuation in the pressure based on the amount of change of the opening of pressure control valve 402. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
