发明名称 HEAT TREATMENT APPARATUS
摘要 <p>[PROBLEMS] To realize a heat treatment apparatus that attains effective prevention of any deposition of sublimation products occurring during heat treatment. [MEANS FOR SOLVING PROBLEMS] When substrate (3) is heated, resin sublimation or solvent evaporation from a resist liquid, etc. applied to the surface of the substrate (3) would occur to cause condensation on fluororesin coating (11) forming an inferior surface of top panel (10). The condensate has a minute diameter due to the formation on the surface of the fluororesin coating (11), and further the fluororesin coating is slippery. Thus, the condensate would travel along the slope thereof and fall downward from an end portion of the top panel (10). The position where condensate drops fall lies outside the substrate (3), so that the condensate would not cause lowering of yield.</p>
申请公布号 WO2008035552(A1) 申请公布日期 2008.03.27
申请号 WO2007JP66847 申请日期 2007.08.30
申请人 TOKYO OHKA KOGYO CO., LTD.;MIYAMOTO, HIDENORI 发明人 MIYAMOTO, HIDENORI
分类号 H01L21/027;G02F1/13;G03F7/26 主分类号 H01L21/027
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