发明名称 |
New titanium, zirconium and hafnium alkenoxides useful for forming thin films, e.g. on electronic or optical components |
摘要 |
<p>Titanium, zirconium and hafnium alkenoxides (I) are new. Metal alkenoxides of formula (I) are new. M(OR) 4 (I) R : 2-propen-1-yl, 1-methyl-2-propen-1-yl or 1,1-dimethyl-2-propen-1-yl. Independent claims are also included for: (1) material (M1) for forming a thin film, comprising a compound (I); (2) producing a thin film by vaporizing M1 over a substrate to form a (I)-containing vapor and forming a thin film on the substrate by decomposing (I) or subjecting (I) to a chemical reaction; (3) producing a thin film by vaporizing M1 over a substrate to form a (I)-containing vapor and forming a thin metal oxide film on the substrate by decomposing (I) or subjecting (I) to a chemical reaction in the presence of a reactive gas containing oxygen or ozone; (4) thin film produced as above.</p> |
申请公布号 |
DE102007042943(A1) |
申请公布日期 |
2008.03.27 |
申请号 |
DE20071042943 |
申请日期 |
2007.09.10 |
申请人 |
ADEKA CORP. |
发明人 |
WADA, SENJI;ABE, TETSUJI;SAKURAI, ATSUSHI;HIGASHINO, TAKASHI;FUJIMOTO, RYUSAKU;SHIMIZU, MASAKO |
分类号 |
C07F7/00;C07F5/00;C23C16/40 |
主分类号 |
C07F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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