| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique capable of improving the throughput of a coating/developing device by reducing time when a substrate resides uselessly by an inspection module. SOLUTION: In an inspection station for passing the substrate treated in a treatment station to a carrier station, a plurality of inspection modules where time required for inspection differs, a buffer unit for allowing the substrate to reside temporarily, and a substrate carrying means for controlling the operation by a control section are provided. While the inspection module treats the substrate, the succeeding substrate to be inspected by the inspection module is carried to the buffer unit by the substrate carrying means for residing, thus restraining the residence of the substrate in the inspection module and improving throughput. COPYRIGHT: (C)2008,JPO&INPIT |
