| 摘要 |
A method of manufacturing sputtering targets comprises the following steps of: 1. wet milling: mixing and grinding indium-tin oxide (ITO) powders, a sintering aid agent, a binder agent, and additive agent by wet milling method; 2. granulation: drying the mixed and grinded mixtures to form granulated ITO powers; 3. shaping: granulated ITO powders into rough-shaped green bodies by using dry pressing; 4. strengthening: strengthening the rough-shaped green bodies by using the cold isostatic pressing; 5. dewaxing: putting rough-shaped green bodies into a high-temperature furnace to remove the additive agent so as to obtain dewaxed green bodies; and 6. sintering: putting the dewaxed green bodies into an controlled atmosphere furnace and sintering the dewaxed green bodies at a gas pressure ranged from 1.1 atm to 1.9 atm. By using the above-mentioned steps, the high-density ITO sputtering targets are obtained.
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