| 发明名称 |
SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF |
| 摘要 |
A sputtering target prepared by the butt joining of metal sheets being made of the same material, wherein an intermetallic compound in a joined portion has an average particle diameter of 60% to 130% of the average particle diameter of the intermetallic compound in a non-joined portion is provided. In the sputtering target, the average particle diameter of an intermetallic compound in a joined portion is approximately the same as that of the intermetallic compound in a non-joined portion.
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| 申请公布号 |
US2008073411(A1) |
申请公布日期 |
2008.03.27 |
| 申请号 |
US20070946577 |
申请日期 |
2007.11.28 |
| 申请人 |
KOBELCO RESEARCH INSTITUTE, INC. |
发明人 |
MATSUMURA HIROMI;YONEDA YOICHIRO |
| 分类号 |
B23K20/12;B23K20/22;C23C14/34 |
主分类号 |
B23K20/12 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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