<p>The invention relates to a fluid component characterised in that it includes: - at least one substrate (32) of a material that can be etched and an etch stop layer (34) for said material; - means (38) for detecting the properties of a fluid and/or for activating said fluid and provided on a first side of said etch stop layer; - and means (40) for receiving said fluid, formed in the substrate and provided on the second side of the etch stop layer.</p>
申请公布号
WO2008034871(A1)
申请公布日期
2008.03.27
申请号
WO2007EP59954
申请日期
2007.09.20
申请人
COMMISSARIAT A L'ENERGIE ATOMIQUE;BIOMERIEUX;POUTEAU, PATRICK;CAMPAGNOLO, RAYMOND;COCHET, MARTINE