COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR FORMATION OF RESIST PATTERN USING THE SAME

摘要

Disclosed are: a composition for the formation of a resist protection film, which shows less damage to a resist film, can form a good, rectangular resist pattern, and can be used regardless of the structure of a resin used in a resist composition; and a method for forming a resist pattern by using the composition. Specifically, disclosed are: a composition for the formation of a resist protection film, which comprises (a) an alkali-soluble polymer and (b) an ether-based solvent; and a method for forming a resist pattern by using the composition.