发明名称 Standard specimen for a charged particle beam apparatus, specimen preparation method thereof, and charged particle beam apparatus
摘要 An object of the present invention is to provide a standard specimen for a charged particle beam enabling highly precise measurement of sub-micron to several 10 mum in size on an image and an apparatus using the standard specimen. In order to attain the above described object, the present invention provides a standard specimen for a charged particle beam including two different specimens for magnification or measurement calibration and a charged particle beam apparatus using the specimens.
申请公布号 US2008073521(A1) 申请公布日期 2008.03.27
申请号 US20070717094 申请日期 2007.03.13
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 YAGUCHI TOSHIE;KAMINO TAKEO;TANIGUCHI YOSHIFUMI
分类号 G01N23/00 主分类号 G01N23/00
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