发明名称 |
Standard specimen for a charged particle beam apparatus, specimen preparation method thereof, and charged particle beam apparatus |
摘要 |
An object of the present invention is to provide a standard specimen for a charged particle beam enabling highly precise measurement of sub-micron to several 10 mum in size on an image and an apparatus using the standard specimen. In order to attain the above described object, the present invention provides a standard specimen for a charged particle beam including two different specimens for magnification or measurement calibration and a charged particle beam apparatus using the specimens.
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申请公布号 |
US2008073521(A1) |
申请公布日期 |
2008.03.27 |
申请号 |
US20070717094 |
申请日期 |
2007.03.13 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
YAGUCHI TOSHIE;KAMINO TAKEO;TANIGUCHI YOSHIFUMI |
分类号 |
G01N23/00 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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