发明名称 METHOD AND APPARATUS FOR PERFORMING LIMITED AREA SPECTRAL ANALYSIS
摘要 A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative to the substrate.
申请公布号 US2008074658(A1) 申请公布日期 2008.03.27
申请号 US20070952748 申请日期 2007.12.07
申请人 发明人 DAVIS MATTHEW F.;LIAN LEI;UO YASUHIRO;WILLWERTH MICHAEL D.;NETCHITALIOUK ANDREI I.
分类号 G01N21/00 主分类号 G01N21/00
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