发明名称 |
METHOD AND APPARATUS FOR PERFORMING LIMITED AREA SPECTRAL ANALYSIS |
摘要 |
A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative to the substrate.
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申请公布号 |
US2008074658(A1) |
申请公布日期 |
2008.03.27 |
申请号 |
US20070952748 |
申请日期 |
2007.12.07 |
申请人 |
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发明人 |
DAVIS MATTHEW F.;LIAN LEI;UO YASUHIRO;WILLWERTH MICHAEL D.;NETCHITALIOUK ANDREI I. |
分类号 |
G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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