发明名称 |
SURFACE SWITCHABLE PHOTORESIST |
摘要 |
A material is provided for use in an immersion lithographic process of a semiconductor substrate. The material includes a photo-sensitive polymer configured to turn soluble to a base solution in response to reaction with an acid and at least one of either a base soluble polymer or an acid labile polymer. The base soluble polymer is configured to turn soluble to water in response to reaction with a developer solution. The acid labile polymer is configured to turn soluble to water after releasing a leaving group in reaction to the acid. |
申请公布号 |
US2008076038(A1) |
申请公布日期 |
2008.03.27 |
申请号 |
US20060534289 |
申请日期 |
2006.09.22 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHANG CHING-YU;CHIU CHIH-CHENG |
分类号 |
G03F1/00;G03C1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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