LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus including: an illumination system for adjusting a beam of radiation; and to provide a support structure designed to support a patterning device.

SOLUTION: In the lithographic apparatus, a purge hood of a purge system supplies gas to at least a part of a projection system and/or to a purge volume including at least a part of the illumination system; and the purge food floats on a substrate and/or a substrate table by gas bearings. The gas bearings 12 and 14 serves as a coupling device for keeping a gap 22 between each of the gas bearings and a substrate W stable and small by a gas flow control with a control element 26.

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