| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device wherein a problem of particles caused by making a tweezer from ceramic is solved by self-maintenance. SOLUTION: In an oxidation/dispersion device which has a wafer transfer device 23 for transferring a wafer 1 between a cassette 2 and a boat 28 by holding with the tweezer 25, a gas blowing mechanism 31 for blowing a gas 33 to the tweezer 25 is installed at a home position 30 of the wafer transfer device 23 in a transfer chamber, and a suction mechanism 36 for sucking the gas 33 blown out from the gas blowing mechanism 31 is so installed as to face the gas blowing mechanism 31 with the tweezer 25 inbetween. A particle monitor 39 is attached to a suction exhaust piping 38 constituting the suction mechanism 36, and an ionizer 40 is provided to the suction mechanism 36. Thereby the particles, etc. adhering or sticking to the tweezer 25 are cleaned by the blown gas. COPYRIGHT: (C)2008,JPO&INPIT
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