发明名称 SUBSTRATE TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment method for preventing a substrate from being polluted while suppressing increase of cost when manufacturing the treated substrate. SOLUTION: When the substrate is stored at a storage shelf 5 and is conveyed by a storage container conveyance device 8, a lid of a storage container 2 is closed to ventilate by a fan filter unit, thereby maintaining high degree of cleanliness of the substrate. When the substrate is conveyed by a substrate conveyance device 7 in a substrate coming-in-and-out part 6, the lid of the storage container 2 is opened to ventilate by the fan filter unit and maintain high degree of cleanliness in a substrate conveyance area 24 by a cleaning air ventilating means 25 for the conveyance area, thereby maintaining high degree of cleanliness of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008068963(A) 申请公布日期 2008.03.27
申请号 JP20060248171 申请日期 2006.09.13
申请人 DAIFUKU CO LTD 发明人 MORIYA SUSUMU;IKEHATA YOSHITERU
分类号 B65G1/00;B65G49/06;G02F1/13;H01L21/677 主分类号 B65G1/00
代理机构 代理人
主权项
地址