发明名称 MODULAR CVD EPI 300MM REACTOR
摘要 The present invention provides methods and apparatus for processing semiconductor substrates. Particularly, the present invention provides a modular processing cell to be used in a cluster tool. The modular semiconductor processing cell of the present invention comprises a chamber having an inject cap, a gas panel module configured to supply one or more processing gas to the chamber through the inject cap, wherein the gas panel module is position adjacent the inject cap. The processing cell further comprises a lamp module positioned below the chamber. The lamp module comprises a plurality of vertically oriented lamps.
申请公布号 US2008072820(A1) 申请公布日期 2008.03.27
申请号 US20070767619 申请日期 2007.06.25
申请人 APPLIED MATERIALS, INC. 发明人 BURROWS BRIAN H.;METZNER CRAIG R.;DEMARS DENNIS L.;ANDERSON ROGER N.;CHACIN JUAN M.;CARLSON DAVID K.;ISHIKAWA DAVID M.;CAMPBELL JEFFREY;COLLINS RICHARD O.;MAGILL KEITH M.;AFZAL IMRAN
分类号 B05C11/00 主分类号 B05C11/00
代理机构 代理人
主权项
地址