| 摘要 |
Apparatus for generating extreme ultra violet (EUV) radialson comprises a tin EUV source, a chamber housing at least one optical element for directing EUV radiation generated by the EUV source towards a radiation outlet from the chamber, at least one vacuum pump for evacuating the chamber, and means for supplying to the chamber an organic halide for reacting with the deposited on said at least one optical element to form an organo-tin halide. |
