METHOD OF LAYOUT OF THE FINE PATTERN AND APPARATUS OF THE SAME

摘要

A method for designing a fine pattern is provided to transfer a fine pattern as it is to a material by forming a sub pattern for substantially transferring a fine pattern for exposure. The original data of a fine pattern for exposure is read out. The fine pattern is divided into first and second patterns wherein the first pattern needn't to be corrected and the second pattern needs to be corrected. A sub pattern is formed to maintain a first distance with the second pattern so that the fine pattern is corrected. A program including the first pattern, the second pattern and the sub pattern is performed to predict a fine pattern to be transferred to a material. The predicted fine pattern is compared with the original data, and the corrected fine pattern is determined to be a final fine pattern if any difference exists between the predicted fine pattern and the original data. The sub pattern can be a first sub pattern that is independently disposed and maintains the first distance with the second pattern having a width of W1.