发明名称 |
SALT FOR ACID-GENERATING AGENT OF CHEMICALLY AMPLIFIED RESIST COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt functioning as an acid-generating agent giving a chemically amplified resist composition exhibiting high resolution and wide exposure margin. <P>SOLUTION: The salt is expressed by formula (I) (Q<SP>1</SP>and Q<SP>2</SP>are each independently a fluorine atom or a 1-6C perfluoroalkyl group; X is a 1-12C straight or branched-chain bivalent hydrocarbon group; Y is a 1-30C hydrocarbon group which may have substituents; and A<SP>+</SP>is an organic counter ion). <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008069146(A) |
申请公布日期 |
2008.03.27 |
申请号 |
JP20070212732 |
申请日期 |
2007.08.17 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
YOSHIDA ISAO;HARADA YUKAKO;MIYAGAWA TAKAYUKI |
分类号 |
C07C309/17;C07C303/22;C07C381/12;C07D307/00;G03F7/004;G03F7/039 |
主分类号 |
C07C309/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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