发明名称 SALT FOR ACID-GENERATING AGENT OF CHEMICALLY AMPLIFIED RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a salt functioning as an acid-generating agent giving a chemically amplified resist composition exhibiting high resolution and wide exposure margin. <P>SOLUTION: The salt is expressed by formula (I) (Q<SP>1</SP>and Q<SP>2</SP>are each independently a fluorine atom or a 1-6C perfluoroalkyl group; X is a 1-12C straight or branched-chain bivalent hydrocarbon group; Y is a 1-30C hydrocarbon group which may have substituents; and A<SP>+</SP>is an organic counter ion). <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008069146(A) 申请公布日期 2008.03.27
申请号 JP20070212732 申请日期 2007.08.17
申请人 SUMITOMO CHEMICAL CO LTD 发明人 YOSHIDA ISAO;HARADA YUKAKO;MIYAGAWA TAKAYUKI
分类号 C07C309/17;C07C303/22;C07C381/12;C07D307/00;G03F7/004;G03F7/039 主分类号 C07C309/17
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