| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition method and a thin film deposition apparatus in which two or more pairs of targets each connected with an alternating current power supply are arranged side by side, fluctuation in glow discharge caused by an output potential difference between the targets adjacent to each other and connected to the different alternating current power supplies is suppressed, thereby a stable plasma atmosphere is formed and high arc energy produced when abnormal discharge is generated can be suppressed. SOLUTION: In the thin film deposition method, among pairs of targets arranged side by side, the outputs between the targets adjacent to each other and connected to different alternating current power supplies are compared, and when the output potential difference exceeds a prescribed value, the outputs of the alternating current power supplies are adjusted, and the output potential difference is converged to the above prescribed value or below. In the thin film deposition apparatus, the thin film deposition method is implemented. COPYRIGHT: (C)2008,JPO&INPIT
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