FEEDING STRUCTURE OF ELECTROSTATIC CHUCK, METHOD FOR PRODUCING THE SAME, AND METHOD FOR REGENERATING FEEDING STRUCTURE OF ELECTROSTATIC CHUCK

摘要

A feeding structure of an electrostatic chuck comprising a lower insulation layer, an electrode layer and a surface insulation dielectric layer formed sequentially on the upper surface side of a metal substrate with the lower insulation layer closest to the metal substrate, in which the lower insulation layer, the electrode layer and the surface insulation dielectric layer are not cracked easily. The feeding structure of an electrostatic chuck is constituted of a through hole penetrating between the upper and lower surfaces of the metal substrate, a feeding terminal arranged in the through hole and feeding a voltage supplied from the lower surface side of the metal substrate to the electrode layer formed on the upper surface side, and an insulation holding member formed of an electric insulating material in order to insulate the inner wall of the through hole from the feeding terminal and holding the feeding terminal, wherein the feeding terminal has a feeding side end projecting to the upper surface side of the metal substrate, and the tip of the feeding side end is located closer to the electrode layer side than the interface between the electrode layer and the lower insulation layer and below the interface between the electrode layer and the surface insulation dielectric layer.