| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist and polymer monomer which have an oxime group; and a photoresist composition containing the same. <P>SOLUTION: The photoresist monomer is represented by the chemical formula: wherein R<SP>*</SP>are independently a hydrogen atom or a methyl group, and R is either a substituted or unsubstituted 1-25C alkyl group with or without an ether group, or a substituted or unsubstituted 4-25C hydrocarbon group with an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group and with or without an ether group, a ketone group or sulfur. <P>COPYRIGHT: (C)2008,JPO&INPIT |
