| 摘要 |
<P>PROBLEM TO BE SOLVED: To accurately detect a position-deviated quantity even in a substrate processing device with a structure such that a distance between a surface to be imaged and an imaging device varies with the thickness of the substrate and the like. <P>SOLUTION: The system includes a compensation data creating step for creating a compensation data that show a relationship between dimensions on an image screen and a height position of the surface to be imaged to actual dimensions of an object, a mark position deviation detecting step for calculating the position-deviated quantities of marks 2a, 2b from the compensation data found in the compensation data creating step, based on the position-deviated quantity on the image screen and the height position of the surface to be imaged on the substrate 2 by imaging fiducial marks 2a, 2b on the condition that the treated substrate 2 is set at a predetermined position and the substrate 2 and the imaging device 7 are allowed to correspond to each other, and finding the position-deviated quantity of the marks 2a, 2b on the image screen, and a compensation quantity computing step for calculating a substrate position compensation quantity, based on the mark position-deviated quantity found in the mark position deviation detecting step. <P>COPYRIGHT: (C)2008,JPO&INPIT |
